BREWER SCIENCE

Brewer Science is a global leader in developing and manufacturing advanced materials and equipment for the reliable fabrication of cutting-edge microdevices. OPTISTACK® MULTILAYER LITHOGRAPHY The OptiStack ® system advantage. A universal substrate – OptiStack � materials work together to planarize a wide range of topography, effectively creating a "universal substrate" for advanced processes.. Superior optical performance – OptiStack ® modeling systems work with unique paramaters to yield superior pattern fidelity to that of standard modeling systems. ARC - ANTI REFLECTIVE COATINGS As the original bottom anti-reflective coatings (BARCs), ARC ® anti-reflective coatings continue to be the industry benchmark for reflection control and light absorption during photolithography. Our proven line of anti-reflective coatings spans all the way from legacy 365-nm (i-line) processes to cutting-edge 193-nm immersion processes. PROTEK B3 ALKALINE PROTECTIVE COATINGS ProTEK® B3 coatings thin films are spin-applied polymeric coating systems that provide temporary wet-etch protection for CMOS MEMS

circuitry.

SPRAY AND PUDDLE DEVELOPER www.brewerscience.com Where innovation takes flight!SM Page 1 The Brewer Science® Cee® 200XD spray and puddle developer delivers track-quality performance, with revolutionary interface capabilities and the utmost in chemical and process flexibility, in an BREWER SCIENCE WAFERBOND HT-10 www.brewerscience.com Page 2 8 12 16 20 24 28 32 800 1200 1600 2000 2400 Spin Speed (rpm) for 30 seconds Film Thickness (µm) Spin Speed Curve Brewer Science® WaferBOND® HT-10.10 Temporary Wafer Bonding Material ©2011 Brewer Science, Inc. BREWER SCIENCE PROTEK B3 wwwreerieneo Brewer Science ® ProTEK B3 Coating Page 2 ©2012 Brewer Science, Inc. All statements, technical information and recommendations contained herein are based on tests we believe to be accurate, but the accuracy or completeness thereof is not guaranteed and the following is made in lieu of warranty expressed or implied. SIX STEPS TO STRUCTURED PROBLEM SOLVING What happens when a big problem pops up? For most of us, our first reaction is, “Quick! Let’s fix it and make this problem go away.” However, if we rush to fix the problem too quickly, we may end up implementing a “solution” or “quick fix” that doesn’t solve anything because we didn’t take the time to truly identify and understand the root cause of the problem itself. ANTI-REFLECTIVE COATING FOR MULTIPATTERNING LITHOGRAPHY Anti-reflective coating for multipatterning lithography Douglas J. Guerrero, Steve Gibbons, Joyce Lowes, Ramil Mercado Brewer Science, Inc., 2401 Brew er Drive, Rolla, MO 65401, USA NEW BARC MATERIALS FOR THE 65-NM NODE IN 193-NM LITHOGRAPHY 2.2 Ethyl Lactate Film Strip Test A BARC was spin applied to a silicon wafer at 1,500 rpm for 60 s and baked at 205oC for 60 s.After measuring the film thickness, the BARC-coated wafer was placed on a spinner, flooded with ethyl lactate, and allowed to puddle

BREWER SCIENCE

Brewer Science is a global leader in developing and manufacturing advanced materials and equipment for the reliable fabrication of cutting-edge microdevices. OPTISTACK® MULTILAYER LITHOGRAPHY The OptiStack ® system advantage. A universal substrate – OptiStack � materials work together to planarize a wide range of topography, effectively creating a "universal substrate" for advanced processes.. Superior optical performance – OptiStack ® modeling systems work with unique paramaters to yield superior pattern fidelity to that of standard modeling systems. ARC - ANTI REFLECTIVE COATINGS As the original bottom anti-reflective coatings (BARCs), ARC ® anti-reflective coatings continue to be the industry benchmark for reflection control and light absorption during photolithography. Our proven line of anti-reflective coatings spans all the way from legacy 365-nm (i-line) processes to cutting-edge 193-nm immersion processes. PROTEK B3 ALKALINE PROTECTIVE COATINGS ProTEK® B3 coatings thin films are spin-applied polymeric coating systems that provide temporary wet-etch protection for CMOS MEMS

circuitry.

SPRAY AND PUDDLE DEVELOPER www.brewerscience.com Where innovation takes flight!SM Page 1 The Brewer Science® Cee® 200XD spray and puddle developer delivers track-quality performance, with revolutionary interface capabilities and the utmost in chemical and process flexibility, in an BREWER SCIENCE WAFERBOND HT-10 www.brewerscience.com Page 2 8 12 16 20 24 28 32 800 1200 1600 2000 2400 Spin Speed (rpm) for 30 seconds Film Thickness (µm) Spin Speed Curve Brewer Science® WaferBOND® HT-10.10 Temporary Wafer Bonding Material ©2011 Brewer Science, Inc. BREWER SCIENCE PROTEK B3 wwwreerieneo Brewer Science ® ProTEK B3 Coating Page 2 ©2012 Brewer Science, Inc. All statements, technical information and recommendations contained herein are based on tests we believe to be accurate, but the accuracy or completeness thereof is not guaranteed and the following is made in lieu of warranty expressed or implied. SIX STEPS TO STRUCTURED PROBLEM SOLVING What happens when a big problem pops up? For most of us, our first reaction is, “Quick! Let’s fix it and make this problem go away.” However, if we rush to fix the problem too quickly, we may end up implementing a “solution” or “quick fix” that doesn’t solve anything because we didn’t take the time to truly identify and understand the root cause of the problem itself. ANTI-REFLECTIVE COATING FOR MULTIPATTERNING LITHOGRAPHY Anti-reflective coating for multipatterning lithography Douglas J. Guerrero, Steve Gibbons, Joyce Lowes, Ramil Mercado Brewer Science, Inc., 2401 Brew er Drive, Rolla, MO 65401, USA NEW BARC MATERIALS FOR THE 65-NM NODE IN 193-NM LITHOGRAPHY 2.2 Ethyl Lactate Film Strip Test A BARC was spin applied to a silicon wafer at 1,500 rpm for 60 s and baked at 205oC for 60 s.After measuring the film thickness, the BARC-coated wafer was placed on a spinner, flooded with ethyl lactate, and allowed to puddle BREWER SCIENCE ACHIEVES ISO 45001:2018 Brewer Science Achieves ISO 45001:2018 Global technology leader meets the world’s most widely recognized occupational health and safety management standard Rolla, Mo.–June 2021– Brewer Science, a global leader in developing and manufacturing next-generation materials and processes for the microelectronics and optoelectronics industries, is pleased to announce the achievement of ISO 45001 OPTISTACK® MULTILAYER LITHOGRAPHY The OptiStack ® system advantage. A universal substrate – OptiStack � materials work together to planarize a wide range of topography, effectively creating a "universal substrate" for advanced processes.. Superior optical performance – OptiStack ® modeling systems work with unique paramaters to yield superior pattern fidelity to that of standard modeling systems. ELECTRONICS, APPLIANCE & TIRE COLLECTION 8 a.m. to Noon Anything with a cord or battery operated! FREE! Stoves – washers – dryers – water heaters – computer components – keyboards – VCRs/DVD players – cell phones – hairdryers – garden equipment (oil and gas tanks must be removed prior to

recycling) – or

BREWERBOND® 305

BrewerBOND ® 305 series materials are organic temporary bonding materials that improve throughput, simplify cleaning, and shorten processing time.The materials are stable in back-end-of-line processing up to 300°C (depending on downstream process parameters). Debonding is efficient and can be done in two ways when paired with an appropriate release material. PROTEK PSB PROTECTIVE COATING Our ProTEK® PSB protective coating is a spin-on replacement for silicon nitride or silicon oxide wet etch masks. BREWER SCIENCE WAFERBOND HT-10 www.brewerscience.com Page 2 8 12 16 20 24 28 32 800 1200 1600 2000 2400 Spin Speed (rpm) for 30 seconds Film Thickness (µm) Spin Speed Curve Brewer Science® WaferBOND® HT-10.10 Temporary Wafer Bonding Material ©2011 Brewer Science, Inc. PROTEK PSB - BREWER SCIENCE www.brewerscience.com Where innovation takes flight!SM BENEFITS ProTEK � PSB-23 Material Spin Speed Curve ProTEK® PSB Photosensitive Alkaline-Protective Material ProTEK® PSB material is a negative-working photosensitive alkaline etch mask that enables bulk silicon micromachining late in the process while preserving SIX STEPS TO STRUCTURED PROBLEM SOLVING What happens when a big problem pops up? For most of us, our first reaction is, “Quick! Let’s fix it and make this problem go away.” However, if we rush to fix the problem too quickly, we may end up implementing a “solution” or “quick fix” that doesn’t solve anything because we didn’t take the time to truly identify and understand the root cause of the problem itself. BREWER SCIENCE APOGEE BONDER brewerscie nce.com INTEGRATED PROCESS SOLUTION Coating & Baking Bonding Debonding • The Apogee™ bonder completes Brewer Science’s temporary bonding tool suite to support thin wafer handling applications.

APOGEE BAKE PLATE

Apogee™ Bake Plate With DataStream™ Technology The Brewer Science � Cee Apogee™ bake plate features a revolutionary intuitive interface, a space- Where innovation takes flight!SM saving design, and track-quality thermal accuracy and uniformity. www.brewerscience.com

BREWER SCIENCE

Brewer Science has been a technology leader in the fields of specialty materials and equipment for micro- and optoelectronics since 1981. By creating innovative products and technologies, Brewer Science maintains a competitive edge in new and future markets. Click to Read

More.

ARC - ANTI REFLECTIVE COATINGS As the original bottom anti-reflective coatings (BARCs), ARC ® anti-reflective coatings continue to be the industry benchmark for reflection control and light absorption during photolithography. Our proven line of anti-reflective coatings spans all the way from legacy 365-nm (i-line) processes to cutting-edge 193-nm immersion processes. PROTEK B3 ALKALINE PROTECTIVE COATINGS Alkaline protective coating. ProTEK ® B3 coatings thin films are spin-applied polymeric coating systems that provide temporary wet-etch protection for CMOS MEMS circuitry during alkaline or acid etches. ProTEK ® B materials offer protection from alkaline solutions such as KOH and TMAH for extended bath etches. Data Sheet. OPTISTACK® MULTILAYER LITHOGRAPHY OptiStack ® multilayer lithography systems are designed for the most advanced high-volume semiconductor manufacturing processes in the world. Our versatile OptiStack ® material set is designed to be used in combination with our proprietary optical modeling to achieve the finest resolutions possible with 193-nm immersion lithography.

YouTube.

BREWERBOND® 510

BrewerBOND ® 510 material is applied to a carrier using a simple process and is compatible with ≤ 300°C bonding materials. After processing, a low-force separation is used to debond, and the carrier could potentially be reused. Because the carrier may be reused (depending on metallization processes), this material has a lower cost

of

PROTEK PSB PROTECTIVE COATING ProTEK ® PSB coating is a spin-on replacement for silicon nitride or silicon oxide wet etch masks. Brewer Science ® ProTEK ® PSB coating is used in the creation of inverse pyramidal pits as discussed in SUN Microsystems' technical paper, "Active Demonstration of a Passively Self-Aligned, Multi-Chip Package using Proximity Communication in a NISSAN CHEMICAL CORPORATION For nearly 20 years, Brewer Science has licensed its ARC ® material technology to Nissan Chemical. In April 2015, Brewer Science, Inc., and Nissan Chemical Corporation, Ltd., formally extended their business relationship through 2028. This joint agreement focuses on business continuity for customers in Asia by leveraging the combined

strengths

SIX STEPS TO STRUCTURED PROBLEM SOLVING This is the most time-consuming, but one of the most vital steps in the process as we take each potential cause and work to rule it out. We must keep working until we have eliminated everything but the root cause. 4. Verify Root Cause. When we think that we have identified the true root cause, we need verify that it is the root cause by testing ANTI-REFLECTIVE COATING FOR MULTIPATTERNING LITHOGRAPHY Anti-reflective coating for multipatterning lithography Douglas J. Guerrero, Steve Gibbons, Joyce Lowes, Ramil Mercado Brewer Science, Inc., 2401 Brew er Drive, Rolla, MO 65401, USA ADVANCED RINSE PROCESS ALTERNATIVES FOR REDUCTION OF Advanced Rinse Process Alternatives for Reduction of Photolithography Development Cycle Defects Nickolas L. Brakensieka, Peng Zhangb, Danielle Kingb, Craig Ghellia aBrewer Science, Inc.,2401 Brewer Dr., Rolla, MO 65401; bAir Products and Chemicals, Inc., Allentown, PA 18195 ABSTRACT As linewidths continue to decrease in size, preventing smaller defects is becoming critical to maintaining yield.

BREWER SCIENCE

Brewer Science has been a technology leader in the fields of specialty materials and equipment for micro- and optoelectronics since 1981. By creating innovative products and technologies, Brewer Science maintains a competitive edge in new and future markets. Click to Read

More.

ARC - ANTI REFLECTIVE COATINGS As the original bottom anti-reflective coatings (BARCs), ARC ® anti-reflective coatings continue to be the industry benchmark for reflection control and light absorption during photolithography. Our proven line of anti-reflective coatings spans all the way from legacy 365-nm (i-line) processes to cutting-edge 193-nm immersion processes. PROTEK B3 ALKALINE PROTECTIVE COATINGS Alkaline protective coating. ProTEK ® B3 coatings thin films are spin-applied polymeric coating systems that provide temporary wet-etch protection for CMOS MEMS circuitry during alkaline or acid etches. ProTEK ® B materials offer protection from alkaline solutions such as KOH and TMAH for extended bath etches. Data Sheet. OPTISTACK® MULTILAYER LITHOGRAPHY OptiStack ® multilayer lithography systems are designed for the most advanced high-volume semiconductor manufacturing processes in the world. Our versatile OptiStack ® material set is designed to be used in combination with our proprietary optical modeling to achieve the finest resolutions possible with 193-nm immersion lithography.

YouTube.

BREWERBOND® 510

BrewerBOND ® 510 material is applied to a carrier using a simple process and is compatible with ≤ 300°C bonding materials. After processing, a low-force separation is used to debond, and the carrier could potentially be reused. Because the carrier may be reused (depending on metallization processes), this material has a lower cost

of

PROTEK PSB PROTECTIVE COATING ProTEK ® PSB coating is a spin-on replacement for silicon nitride or silicon oxide wet etch masks. Brewer Science ® ProTEK ® PSB coating is used in the creation of inverse pyramidal pits as discussed in SUN Microsystems' technical paper, "Active Demonstration of a Passively Self-Aligned, Multi-Chip Package using Proximity Communication in a NISSAN CHEMICAL CORPORATION For nearly 20 years, Brewer Science has licensed its ARC ® material technology to Nissan Chemical. In April 2015, Brewer Science, Inc., and Nissan Chemical Corporation, Ltd., formally extended their business relationship through 2028. This joint agreement focuses on business continuity for customers in Asia by leveraging the combined

strengths

SIX STEPS TO STRUCTURED PROBLEM SOLVING This is the most time-consuming, but one of the most vital steps in the process as we take each potential cause and work to rule it out. We must keep working until we have eliminated everything but the root cause. 4. Verify Root Cause. When we think that we have identified the true root cause, we need verify that it is the root cause by testing ANTI-REFLECTIVE COATING FOR MULTIPATTERNING LITHOGRAPHY Anti-reflective coating for multipatterning lithography Douglas J. Guerrero, Steve Gibbons, Joyce Lowes, Ramil Mercado Brewer Science, Inc., 2401 Brew er Drive, Rolla, MO 65401, USA ADVANCED RINSE PROCESS ALTERNATIVES FOR REDUCTION OF Advanced Rinse Process Alternatives for Reduction of Photolithography Development Cycle Defects Nickolas L. Brakensieka, Peng Zhangb, Danielle Kingb, Craig Ghellia aBrewer Science, Inc.,2401 Brewer Dr., Rolla, MO 65401; bAir Products and Chemicals, Inc., Allentown, PA 18195 ABSTRACT As linewidths continue to decrease in size, preventing smaller defects is becoming critical to maintaining yield. MICROELECTRONIC LITHOGRAPHY PRODUCTS Permanent Bonding Materials. WaferBOND® HT-10.11 and HT-10.12 Materials. Selective Surface Modification. Advanced Lithography. Brewer Science lithography products have been shaping the semiconductor industry since 1981. Over the years, new product lines, capabilities, and specifications have been improved to deliver the best. Electronics Design. WHAT WE DO | BREWER SCIENCE That’s where we come in. Control the light. Change the world. Brewer Science has been developing cutting-edge materials and processes for controlling light during photolithography for over three decades. Without advances such as ARC® anti-reflective coatings, electronics would not be as small, fast, or affordable as they are today.

PRESS RELEASES

Rolla, Mo.–May 2021– Brewer Science, a global technology leader, is pleased to announce it is now a Certified B CorporationTM. As a B Corp, Brewer Science is committed to. May 17, 2021 Press Release Read More. April 06, 2021 Press Release. OPTISTACK® MULTILAYER LITHOGRAPHY OptiStack ® multilayer lithography systems are designed for the most advanced high-volume semiconductor manufacturing processes in the world. Our versatile OptiStack ® material set is designed to be used in combination with our proprietary optical modeling to achieve the finest resolutions possible with 193-nm immersion lithography.

YouTube.

BREWER SCIENCE ACHIEVES ISO 45001:2018 Brewer Science Achieves ISO 45001:2018 Global technology leader meets the world’s most widely recognized occupational health and safety management standard Rolla, Mo.–June 2021– Brewer Science, a global leader in developing and manufacturing next-generation materials and processes for the microelectronics and optoelectronics industries, is pleased to announce the achievement of ISO 45001

BREWERBOND® 305

BrewerBOND ® 305 series materials are organic temporary bonding materials that improve throughput, simplify cleaning, and shorten processing time.The materials are stable in back-end-of-line processing up to 300°C (depending on downstream process parameters). Debonding is efficient and can be done in two ways when paired with an appropriate release material. TEMPORARY WAFER BONDING PROCESSING THEORY Temporary bonding is proving to be a reliable method for handling and processing thin device wafers. In this method, a device wafer is temporarily adhered to a rigid carrier wafer with a polymeric material. The properties of the polymeric bonding material largely control the stability of the entire structure during thinning and

other processing.

SPRAY AND PUDDLE DEVELOPER www.brewerscience.com Where innovation takes flight!SM Page 1 The Brewer Science® Cee® 200XD spray and puddle developer delivers track-quality performance, with revolutionary interface capabilities and the utmost in chemical and process flexibility, in an SIX STEPS TO STRUCTURED PROBLEM SOLVING This is the most time-consuming, but one of the most vital steps in the process as we take each potential cause and work to rule it out. We must keep working until we have eliminated everything but the root cause. 4. Verify Root Cause. When we think that we have identified the true root cause, we need verify that it is the root cause by testing MATERIALS FOR AND PERFORMANCE OF MULTILAYER LITHOGRAPHY combined stack are required to maintain and acceptable level of reflectivity control for high fidelity reproduction of the aerial image. To achieve resolution at 45-nm node and below with 193nm light, an effective numeric aperture (NA) greater than 1.0 is This website stores cookies on your computer. These cookies are used to collect information about how you interact with our website and allow us to remember you. We use this information in order to improve and customize your browsing experience and for analytics and metrics about our visitors both on this website and other media. To find out more about the cookies we use, see our Privacy Policy

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Dr. Terry Brewer’s discovery of anti-reflective coatings resulted in a revolution in the global microelectronics industry and ushered in today’s high-speed, lightweight electronic devices.

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Dr. Terry Brewer’s discovery of anti-reflective coatings resulted in a revolution in the global microelectronics industry and ushered in today’s high-speed, lightweight electronic devices.

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